Flow stress improvement of a nickel multicrystal by physical vapor thin film deposition to reduce surface effects - Nantes Université
Journal Articles Materials Letters: X Year : 2022

Flow stress improvement of a nickel multicrystal by physical vapor thin film deposition to reduce surface effects

Abstract

Uniaxial tensile tests were carried out on nickel sheets containing only few grains across the thickness thus presenting a so-called multicrystalline state. Pristine sheets used as reference and substrates covered by a nickel layer deposited by physical vapor deposition (magnetron sputtering) were studied. Results attest that the surface treatment affects the plastic deformation mechanisms by playing the role of a blocking barrier to dislocation movement which leads to a significant improvement of mechanical performances. The surface restructuring of the nickel sheets is efficient to stop dislocation escape through free surfaces and allows a mechanical improvement of the well-known strong mechanical softening of the multicrystals.
Fichier principal
Vignette du fichier
2022_Materials Letters X.pdf (700.38 Ko) Télécharger le fichier
Origin Publication funded by an institution

Dates and versions

hal-03671734 , version 1 (18-05-2022)

Identifiers

Cite

Pierre-Antoine Dubos, Ameni Zaouali, Pierre-Yves Jouan, Mireille Richard-Plouet, Valerie Brien, et al.. Flow stress improvement of a nickel multicrystal by physical vapor thin film deposition to reduce surface effects. Materials Letters: X, 2022, 14, pp.100145. ⟨10.1016/j.mlblux.2022.100145⟩. ⟨hal-03671734⟩
130 View
47 Download

Altmetric

Share

More