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77
Nombre de notices
277
Mots-clés
Low-pressure plasma processing
BOMBARDMENT
Atomic force microscopy
Titanium dioxide
Transmission electron microscopy
Ambipolar material
Avalanche breakdown
Chemical and biological sensors
Ablation laser
A Chalcogenides
AlN
CNTs’ collapse
CIGSe
Mott insulator
XPS
Oxides
A3 Physical vapor deposition processes
Resistive switching
Bipolar resistive switching BRS
Thin films
Band gap
Plasmas froids
Kirkendall effect
CaTiO3Pr^3^+
X-ray photoelectron spectroscopy
Semiconductors
Optical properties
B Chemical synthesis
Chemical detection
Capacitance
Amorphous
Alloying
Carbon nitride
B3 Solar cells
B2 Quaternary
Alzheimer's disease
Mott insulators
SF 6
Spectroscopic ellipsometry
Chalcogenide glass
B2 Semiconducting alloys
Biomasse
Sol-gel
Carbon nanotubes
V2O3
Carbon Nanotube
CHLORINE PLASMAS
Etching
Structure
Thin film
Band alignment
Applications industrielles
Plasma etching
Calcined clay
B2 Semiconducting indium compounds
C Photoelectron spectroscopy
Magnetron sputtering
Atomic layer etching
Films
Chalcogenide
A1 Characterization
Bixbyite
Biocapteurs
B1 Inorganic compounds
Scanning electron microscopy
AuCu alloy
Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation
Anatase
A-CNx
NEXAFS
Buffer Couple
A Thin films
TiO2
Physical vapor deposition
3 nm in size
Vanadium Sesquioxide
Amyloid precursor
Cathepsin
Carbon
Residual stress
Functionalization
Selenization
Nanocomposite
CH4
Aluminium nitride
Sputtering
Transfert d'énergie
Copper
AZO thin films
Non-volatile memory
X-ray diffraction
Nanotubes
Colloidal solution
Adsorption
Chalcogenides
PECVD
Aryl-diazonium salts
Biofilms microbiens
A Multilayers
TEM